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AEGIS Series
内置小型Plasma Module,安装在半导体和显示器制造设备的排气line上,分析排出的气体,对工程变化状态进行monitoring
 
优点

√  国内市场占有率第一
√ 丰富的海外出口实绩(美国,日本,中国100台)
√ 保有多样化的提高耐用性的技术
√ 安定的系统构造和数据处理方式
√ 多样的工程适用经验和技术



Customer Benefits
√ Technical expertise, all products developed our own technology
√  Continuous upgrade in the application in response to customer feedback
√  H/W, S/W customization options available to fit customer needs

 

   1. Application
    - PVD, (PE)CVD, (PE)ALD, Etcher,  all TM @semiconductor/display manufacturing
    - Ti TM/PM, W PM, WN TM/PM/Ex, TSN TM, C&C(Si etch) TM, OxALD PM, Diffusion PM
    - In-situ leak detection
    - ALD Source monitoring
    - Dry cleaning endpoint optimization
    - Process fault detection
    - In-situ fault detection caused by any chamber condition’s changes
    - Necessary in-situ gas monitoring to prevent unexpected process accident
   2. Features
    - RF plasma ignition : 0mT~10Torr
    - In-situ monitoring for 200~850nm
    - Use highly sensitive CCD sensor(2,048pixels)
    - Advanced EPD algorithms : Fine leak detection algorithm, Life time management

  3. SPOES vs. RGA (in CVD/ALD/Etcher processes)
SPOES
Item
RGA
0mT~10Torr
Pressure range
< 5x10-3Torr
Good
In-situ monitor
Impossible because of damaging
from reactant gases such as F, Cl
No need
Additional pumping
Need
No need
Internal filament
Need
Possible
Self cleaning
Impossible
Window & Tube (>1 year)
Maintenance parts (Period)
Filament (< 3 months)
Operating Principles
 
 
 
Specification
Category
Item
Description
Pressure Starting Pressure of Discharge 0mT~10Torr
Composition Detectors / Controller 1~4 (Max. 12)
Optic CCD Sensor 2048 pixels / 16bits
Spectral Range 200~850nm (UV to NIR)
Optical Resolution <±0.5nm
Integration Time Min. 7ms
Scan Time (Interval Time) Min. 50ms
Optical Window Sapphire
Power CCD Plasma Source Power Max. 30W
Power Requirement 3.5A/12VDC
Operation Operating System Windows XP, Windows7
Software AOS (AEGIS Operating Software)
Communication Ethernet
Protocol TCP/IP, SECS, SECSII/GEM, SSCP
Customiztion options available
Mechanic Additional Pumping N/A
Vacuum Interface ISO NW25 (Reducer Available)
Model
 
  1. Detector
 
    √ 为延长life time 针对各工程提供专业化model
照片 说明
AEGIS-7W
- for Process Chamber (Tungsten)
- Contamination Free Module Upgrade (patented)
AEGIS-7NH
- for Process Chamber(use at the case of contamination from
viscous powder)
- Contamination Free Module Upgrade (patented)
- Heating Type
  2. Controller
 
    根据安装环境,顾客要求提供最优model
照片 说明
SMC-10 (standard type)
- Horizontal Type
- 3U 19” rack mount type
SMC-10H (I)
- Vertical Type
- Keyboard, Mouse, Monitor all in one type
SMC-10H (II)
- Vertical Type
- with Work Table & Monitor Arm
Application
  1. Leak Detection
  2. Cleaning Optimization
  3. Process Analysis
  4. ALD Source Verification