- Control the process accurately and stably
- Improve Production yield rate
- Cope with the changes of process promptly

- Suggest the optimized solution for HW or SW to detect an endpoiny

- EPD (End Point Detection) 
- Dry etcher, Asher etc.

- can be applied where necessary to increase throughput by determining the optimal etch time

- In-situ monitoring for filtered wavelength of 10nm bandwidth 
- Use highly sensitive single Si photodiode 

- Advanced EPD algorithms such as threshold and window method

- PR asher: single/multi layer, single/multi recipe 
- More than 3,000 are operated in semiconductor mass production line