NANOTEK SPOES (Model AEGIS-1000) is advanced process monitoring sensor based on proprietary plasma emission source and detector. This lets you realize the advantages of in-situ process monitoring at semiconductor manufacturing.
The advantages of this are the following; APC/FD -Fault/Excursion/Leakage detection Tool Availability -Cleaning/Seasoning Optimization Process Knowledge
-Process drift analysis
-Tool/Chamber matching
Its applications are the following; ALD(atomic layer deposition) CVD(chemical vapor deposition) Etcher
HARDWARE CONFIGURATION
GENERAL SPECIFICATION
ITEM
DESCRIPTION
Operating Pressure
5mT~3T
Spectral Range
200~850nm (UV to NIR)
Resolution
<0.5nm
Differential Pumping
Not need
MODEL SPECIFICATION
MODEL
ITEM
DESCRIPTION
Detector
AEGIS-
1000D
ICP Plasma Source
Up to 30W RF power
Connecting
ISO NW16, available to any size
Optical Window
Sapphire
Cooling
Forced air-cooled
Spectrometer (Built-in type)
2,048 pixels / 16 bits CCD sensors
Dimension
90(W)X94(H)X193(D)mm
Weight
About 1kg
Controller
AEGIS-
1000C
Power Input
110/220VAC, 50/60Hz
Detector/Controller
Up to 4
Storage Capacity
6 months (full spectrum, 1sec)
Untitled Document
153-801, #409 Leaders Tower, 60-15 Gasan-dong, Geumcheon-gu, Seoul, Korea
TEL : 82-2-837-8867~8 | FAX : 82-2-837-8820 | E-mail : nanotek@nanotek.com
APC/FD
