Nanotek’s EPD system monitors gas pressure, RF power mismatch, chemical species and particles produced during etching chamber’s inside in real time detecting the specific point while etching or developing process in the manufacturing of LCD panels and Semi-conductor.
The NanoEPD uses so variable kinds of proprietary operation algorithms that it can analyze very small changes of signal to detect Endpoint accurately. Also, the NanoEPD supports the OES function for spectrum analysis.
Nanotek is fully supporting on customer’s demand for endpoint detection. We are able to supply such variable types of EPDs as filter, monochromator and CCD type.