| 2006 |
7. |
Wafer Orienter(Flat Zone Aligner) FZA-100 |
 |
2005 |
8. |
CCD type EPD/OES NEC-410 |
9. |
Certificated as Inno-Biz company by Small and Medium Business Administration |
12. |
SPOES(Self Plasma OES) AEGIS-1000 |
|
| 2004 |
7. |
Optical Powermeter NLS-OP01, High power |
|
| 2003 |
2. |
Mask Aligner NMA6, 6"Size |
12. |
Reflectometer NRM816, 800~1600nm |
|
| 2002 |
2. |
500W UV exposure system Stabilight˘â NLS-HG50 |
7. |
Fiber optic link, video/data/audio transmitter and receiver NOC-110, NOC-410 |
8. |
Constructed clean-room and facility for fabrication line |
|
| 2001 |
1. |
NanoEPD-2000 for EPD/OES system |
3. |
Certificated as Venture company by Small and Medium Business Administration |
|
| 2000 |
9. |
SALS(Small Angle Light Scattering) system SALS-2000 |
10. |
FLU(Front Light Unit) for reflective TFT-LCD 2", 3" type |
12. |
Established opto-electronics laboratory |
|
| 1999 |
3. |
Appointed as the high-competitive technology company by Small and Medium Industry Promotion |
10. |
Appointed as the information-oriented promotion corporation by Ministry of Information and communication |
12. |
Laser vehicle velocity detector for ITS |
|
| 1998 |
7. |
Incorporated as Nanotek, Inc. |
8. |
Multi-wavelength/polarizing laser wireless optical communication equipment |
2. |
Appointed as the promising export corporation by Small Business Corporation |
|
| 1997 |
3. |
Appointed as the excellent technology(IT) industry by the Ministry of Information and Communication |
10. |
EPD(End Point Detector) system |
|
| 1996 |
8. |
UV exposure system ALHG-1005D |
|
| 1994 |
5. |
Laser silicon monitoring system |
|
| 1993 |
12. |
Established ALTECH(Applied Laser Technology) |
